Searching for solutions for next-generation tech

As our electronic devices become ever more sophisticated, silicon integrated circuit chips are required to increase their functionality while continually decreasing in size.

In the search for new technologies to meet the demands of next generation devices, scientists at Aberystwyth University are exploring an emerging field of research known as area selective deposition (ASD). ASD allows for nanoscale patterning of materials replacing the use of traditional photolithographic and etch steps which can be time-consuming, expensive and wasteful of materials.

Dr Anita Brady-Boyd from Aberystwyth’s Department of Physics received support through the AberCollab programme to strengthen collaboration with Imec, a world-leading independent nanoelectronics research and development hub based in Belgium.

“My current research focuses on area selective deposition as a means of bottom-up nanofabrication for next generation electronic devices. It is an exciting but relatively new field of research which could lead to a major shift in how devices are fabricated. Through our AberCollab project, we wanted to share with industry the particular surface science expertise we have at Aberystwyth and to explain the different characterisation and measurements we can offer as well as explore how we can work together to provide possible solutions. We already had links with Imec, a world leader in semiconductor and nanoelectronics, and AberCollab has enabled us to strengthen this collaboration as well as pursue other research goals.”